Manufacturing Process of OSP
Degreasing—>Water cleaning—>Microetch—>Water cleaning—>pickling—> DI water cleaning—>Formed film and drying—>DI water cleaning—>Drying
1. Degreasing
The effect of oil removal directly affects the quality of film formation. The film thickness is uneven when the oil is not clear.
On the one hand, the concentration can be controlled within the range of the process by analyzing the solution.
On the other hand, often check if the degreasing worked. If not, replace it with an oil remover.
2. Microetch
The purpose of etching is to form a roughened copper surface to facilitate film formation. The thickness of the etching directly influences the rate of film formation.
Therefore, it is very important to maintain a stable thickness of the film to maintain the thickness of the etched film.
Generally, it is appropriate to control the etching thickness at 1.0-1.5um. The micro corrosion rate can be determined before each production. The etching time is based on the micro etching rate.
3. Film formation
DI water is best used for washing before film formation, so as to prevent contamination of the film forming fluid.
After washing the film, use DI water. The pH should be 4.0-7.0 to avoid contamination and damage. The key to the OSP process is to control the thickness of the oxide film. The film is too thin. Its heat shock resistance is low.
In reflow soldering, the film must resist high temperatures (190-200 °C). This affects the welding performance on the assembly line.
Film is not very good in the flux of dissolved, welding performance. The average control film thickness is between 0.2-0.5um.